반도체 포토공정에서 총 작업흐름시간을 최소화하기위한 스케쥴링 방법론에 관한 연구

• 영문명: Scheduling algorithms for minimizing total flowtime in photolithography workstation of FAB
• 발행기관: 한국산업경영시스템학회
• 저자명: 최성우 이규배
• 간행물 정보: 『한국산업경영시스템학회 학술대회』2011년 추계학술대회 논문집, 3~10쪽, 전체 8쪽
• 주제분류: 공학 > 산업공학
• 파일형태: PDF
• 발행일자: 2011.10.27

영문 초록

This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility. and sequence-dependent recipe set up times may be required at the photolithography machines. In addition. a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms. in which developed machine selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.

목차

Abstract

1. 서론

2. 문제정의

3. 휴리스틱 알고리듬

4. 실험(Computational experiments)

5. 결론

7. 참고문헌

키워드

Scheduling photolithography Heuristics sequence-dependent recipe setup Mask