A New Look at the Object (A)symmetry in Bantu Locative Applicatives

• 발행기관: 한국생성문법학회
• 저자명: Hyun Kyoung Jung
• 간행물 정보: 『생성문법연구』제23권 제4호, 727~750쪽, 전체 23쪽
• 주제분류: 인문학 > 언어학
• 파일형태: PDF
• 발행일자: 2013.11.30

영문 초록

This paper investigates the object (a)symmetry of locative applicatives in two Bantu languages - Kinyarwanda and Chicheŵa. I argue that in both Kinyarwanda and Chicheŵa, the locative applicative is projected higher than VoiceP, based on the types of co-occurring roots and the distributions of the locative applicative suffix with respect to passive morphology. Thus, unlike McGinnis's (2001; 2002) analysis, the object (a)symmetry of the locative applicatives cannot be attributed to the syntactic locus of the applicative head. I propose that the source of (a)symmetry results from elsewhere - namely, the distinct categorial status of Location arguments in Kinyarwanda and Chicheŵa. The multiple applicatives in Chicheŵa and the restrictions imposed on the causative of locatives in Kinyarwanda further support the proposed alternative. Finally, with the understanding of the independent property of locative inversion and an additional assumption about equidistance, the patterns of subject movement in active locatives follow naturally.

목차

Abstract

1. Introduction

2. Object (A)symmetry and Applicative Typology

3. Locative Applicative (A)symmetry in Bantu

4. Proposal: The Structure of Locative Applicative and The Source of (A)symmetry

5. Further Evidence for Locative Applicative above VoiceP

6. Active Sentences and Locative DP/PP

7. Conclusions and Future Directions

References

키워드

object (a)symmetry applicative locative double object argument structure Bantu