플라즈마 채널링을 이용한 나노파티클 건식세정 연구

• 영문명: Laser dry cleaning by plasma channeling
• 발행기관: 한국레이저가공학회
• 저자명: 조성학(Sung-Hak Cho) 박정규(Jung-Kyu Park) 유병헌, 장원석(Won-seok Chang) 김재구(Jae-gu Kim) 황경현(Kyung-Hyun Whang)
• 간행물 정보: 『한국레이저가공학회 학술대회 논문집』2008년도 추계학술발표대회 논문집, 111~111쪽, 전체 1쪽
• 주제분류: 공학 > 기계공학
• 파일형태: PDF
• 발행일자: 2008.11.30

영문 초록

The effective removal of nano particles from silicon wafer surface was demonstrated using the self-channeled plasma filament excited by a femtosecond (130fs) Ti:Sapphire laser (λρ=790 nm). This process has achieved successfully the removal of 100 nm sized polystyrene latex (PSL) particlesfrom the surface. The photoinduced self-channeled plasma filament in air reached a length of approximately 110-130 mm from the first focal spot with the diameters ranging from 40 to 50 ㎛ at the input intensities more than 1.0x10¹⁴W/㎠. By the scan of wafer using the X-Y-Z stage duringself-channeled plasm filament, the removal variation of nano particles on surface was observed in situ before and after plasma filament occurred. The cleaning efficiency was strongly dependent on the gap distance between the plasma filament and the surface. The removal efficiency of nano particles reached to 97% with no damage on the surface when the gap is 150 ㎛.