유리성형용 카본금형의 표면조도에 미치는 고출력 스퍼터링 조건의 영향

• 영문명: The Effect of High Power Sputtering Conditions on Surface Roughness of Carbon Mold for Glass Forming
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 주성후(Sung-Hoo Ju) 양재웅(Jae-Woong Yang)
• 간행물 정보: 『한국응용과학기술학회지』제41권 제1호, 46~57쪽, 전체 12쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 2024.02.28

영문 초록

In this study, the various process conditions for high-power DC Magnetron Sputtering (DCMS) on the surface roughness of carbon thin films were investigated. The optimal conditions for Si/C coating were 40min for deposition time, which does not deviate from normal plasma, to obtain the maximum deposition rate, and the conditions for the best surface roughness were –16volt bias voltage and 400watt DC power with 1.3x10-3torr chamber pressure. Under these optimal conditions, an excellent carbon thin film with a surface roughness of 1.62nm and a thickness of 724nm was obtained. As a result of XPS analysis, it was confirmed that the GLC structure (sp2 bonding) was more dominant than the DLC structure (sp3 bonding) in the thin film structure of the carbon composite layer formed by DC sputtering. Except in infrequent cases of relatively plasma instability, the lower bias voltage and applied power induces smaller surface roughness value due to the cooling effect and particle densification. For the optimal conditions for Graphite/C composite layer coating, a roughness of 36.3 nm and a thickness of 711 nm was obtained under the same conditions of the optimal process conditions for Si/C coating. This layer showed a immensely low roughness value compared to the roughness of bare graphite of 242 nm which verifies that carbon coating using DC sputtering is highly effective in modifying the surface of graphite molds for glass forming.

목차

1. 서론

2. 연구방법

3. 결과 및 고찰

4. 결론

References

키워드

sputtering roughness graphite coating glass forming