인쇄 제판용 Photoresist의 합성과 G.S법에 의한 감광특성 비교;인쇄 제판용 Photoresist의 연구[II]

• 영문명: Synthesis and Photosensitive Characterization Comparison by Gray Scale of Photoresist for Printing Plate;Study of the Photoresist for Printing Plate[II]
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 이기창
• 간행물 정보: 『한국응용과학기술학회지』한국유화학회지 제14권 제2호, 27~34쪽, 전체 8쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 1997.08.30

영문 초록

Naphthoquinone-1,2-diazide-5-sulfonyl [NDS]derivatives members of Quinone diazide compound that are utilizable as photoresist for printing plate were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resin(PF, CF) at various weight ratios. Photosensitive characteristics of photoresist were studied by Gray scale method, and SEM to analyze if they can be used as photosensitive material in a printing plate. Experimental results showed using IR, UV, NDS derivatives were photoconverted and developer-soluble photoresist were produced. Photoresist in the mixing ratio of 1:4 of NDS[II] and CF resin gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity.