펨토초 레이저를 이용한 실리카 내부의 다층 회절격자 가공 기술

• 영문명: Direct writing of multi-layer diffraction grating inside fused silica glass by using a femtosecond laser
• 발행기관: 한국레이저가공학회
• 저자명: 최훈국(Hun-Kook Choi) 김진태(Jin-Tae Kim) 손익부(Ik-Bu Sohn) 노영철(Young-Chul Noh)
• 간행물 정보: 『한국레이저가공학회지』한국레이저가공학회지 제14권 제3호, 17~20쪽, 전체 4쪽
• 주제분류: 공학 > 기계공학
• 파일형태: PDF
• 발행일자: 2011.09.30

영문 초록

We fabricated a multi-layer diffraction grating inside fused silica glass by using a femtosecond laser direct writing method. The femtosecond laser with a wavelength of 515 ㎚, a pulse width of 250 fs, a repetition rate of 100 ㎑, and an average output power of 6 W was used. Two layer diffraction grating with a grating period of 6 ㎛ was successfully fabricated with the layer gap of 0.5, 1, 2, 3, and 5 ㎛, respectively. Also, we investigated the diffraction pattern by illuminating a He-Ne laser beam. Finally, we demonstrated the diffraction grating with a grating period of 3 ㎛ by adjusting the gap of each layer with a grating period of 6 ㎛. Femtosecond laser direct writing technology of multi-layer has a potential to fabricate the diffraction grating with a grating period of below 1.5 ㎛.

목차

ABSTRACT

1. 서론

2. 실험

3. 결론

4. 후기

References

키워드

회절격자 펨토초 레이저 다층 격자 격자 간격 직접 가공 Diffraction grating Femtosecond laser Multi layer grating Grating period Direct writing