나노초 펄스 레이저를 이용한 발광폴리머 패터닝

• 영문명: Selective Ablation of Emissive Polymer Using Nanosecond-pulsed Laser
• 발행기관: 한국레이저가공학회
• 저자명: 고정수(J. S. Ko) 오부국(B. K. Oh) 김두영(D. Y. Kim) 이재영(J. Y. Lee) 이승기(S. K. Lee) 정수화(S. H. Jung) 홍순국(S. K. Hong)
• 간행물 정보: 『한국레이저가공학회지』한국레이저가공학회지 제14권 제3호, 7~11쪽, 전체 5쪽
• 주제분류: 공학 > 기계공학
• 파일형태: PDF
• 발행일자: 2011.09.30

영문 초록

As an active emission display using emissive polymer has had much attention recently, needs for a selective patterning of emissive layer for those displays have been increased abruptly. Therefore, the various laser sources in terms of its wavelength has been used for laser direct patterning. In this work, the feasibility of those processes is examined using numerical analysis and the experimental investigation. A sample has multi-layered structure, emissive polymer on aluminum which is deposited on a glass substrate. Key factors for optimizing the laser patterning of the emissive polymer are considered into the control of ablation products, large-sized particle, and the choice of the appropriate wavelength for minimizing the heat affected zone and the remnant layer.

목차

Abstract

1. 서론

2. 수치해석

3. 실험방법

4. 결과 및 고찰

5. 결론

References

키워드

발광폴리머 나노초 펄스레이저 다층막 레이저 패터닝 Emissive polymer Nanosecond-pulsed laser Multi-layer Laser patterning