NDAS 유도체의 합성과 감광특성

• 영문명: Synthesis and Photosensitive Characterization of NDAS Derivatives
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 이기창(Lee Ki Chang) 최성용(Choi Sung Yong) 배남경(Bae Nam Kyoung) 윤철훈(Yoon Cheol Hun) 황성규(Hwang Sung Kwy)
• 간행물 정보: 『한국응용과학기술학회지』한국유화학회지 제13권 제3호, 145~153쪽, 전체 9쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 1996.11.30

영문 초록

Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak (a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1 : 4(by mass) of NDAS + p-hydroxybenzophenone + sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.

목차

ABSTRACT

I. 서론

II. 실험

III. 결과 및 고찰

IV. 결론

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