Trihydric Phenol계 Photoresist의 합성과 그 감광 특성

• 영문명: Synthesis and Photocharacteristics of Trihydric Phenol Photoresist
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 홍의석(Hong Eui Suk) 고재용(Ko Jae Yong) 박홍수(Park Hong Soo)
• 간행물 정보: 『한국응용과학기술학회지』한국유화학회지 제13권 제1호, 47~54쪽, 전체 8쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 1996.05.30

영문 초록

Cinnamoyl ester(PGEFC) of poly(phloroglucinol-formaldehyde) glycidyl ether which has photosensitive functional group was prepared to apply to photoresist. Photosensitivity of PGEFC was estimated by the solubility difference in organic solvent before and after exposure to light. The yield of residual film was calculated by immersing the sample-coated quartz plates in the solvent which was used in coating. The yield of the residual film which was closely related to the sensitivity of the film, was affected by the degree of polymerization of the backbone resin, sensitizers and their concentration. The sensitivity was depended upon the degree of polymerization. Most of effective sensitizer for PGEFC among the sensitizers was 2, 6-dichloro-4-nitroaniline.

목차

ABSTRACT

I. 서론

II. 재료 및 방법

III. 결과 및 고찰

IV. 결론

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