인쇄 제판용 Photoresist의 잔막수율법에 의한 용해도 비교

• 영문명: Solubility Comparison by Yield Method of Residual of Photoresist for Printing Plate
• 발행기관: 한국응용과학기술학회 (구.한국유화학회)
• 저자명: 윤철훈(Yoon, Cheol-Hun) 황성규(Hwang, Sung-Kwy) 오세영(Oh, Se-Young) 최성용(Chio, Sung-Yong) 이기창( Lee, Ki-Chang)
• 간행물 정보: 『한국응용과학기술학회지』한국유화학회지 제15권 제1호, 25~33쪽, 전체 9쪽
• 주제분류: 공학 > 화학공학
• 파일형태: PDF
• 발행일자: 1998.03.30

영문 초록

Photoresist is defined as substance that makes chemical changes in its solubility, colouring and hardening by light energy. In this study, photosensitive photoresists of the positive type for a printing plate were studied. PF, o-, m-, p-CF resins as a matrix resin were synthesized at an identical condition. Photoresists were prepared by mixing NDS derivatives with a matrix resin at various mixing ratios. Characteristics of photoresists were studied by yield method of residual using solubility and Optical microscope was also analyzed. Prepared photoresist using NDS derivatives shows excellent photosensitivity and solubility compared with commercial product. The mixing ratio of 1:4(by mass) of NDS derivative[III] and m-CF resin shows the highest dissoultion rate among others. In addition, photoresist was obtained at this condition resulted in the superior sensitivity and contrast.